You wish to end up with a 2um width metal line (measured at the top of the metal lead cross section). A) You are using an isotropic wet etch process on a 1um thick metal layer. What linewidth should the protective photoresist line be to get these results? Sketch the resulting structure before photoresist strip. B) now you are using a completely anisotropic etch, what is the requisite linewidth of the photoresist to achieve the same end goal? Sketch the resulting structure before the stripping of the photoresist.
You wish to end up with a 2um width metal line (measured at the top of the metal lead cross section). A) You are using an isotropic wet etch process on a 1um thick metal layer. What linewidth should the protective photoresist line be to get these results? Sketch the resulting structure before photoresist strip. B) now you are using a completely anisotropic etch, what is the requisite linewidth of the photoresist to achieve the same end goal? Sketch the resulting structure before the stripping of the photoresist.
Electricity for Refrigeration, Heating, and Air Conditioning (MindTap Course List)
10th Edition
ISBN:9781337399128
Author:Russell E. Smith
Publisher:Russell E. Smith
Chapter12: Electronic Control Devices
Section: Chapter Questions
Problem 14RQ
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Q8 - You wish to end up with a 2um width metal line (measured at the top of the metal lead cross section). A) You are using an isotropic wet etch process on a 1um thick metal layer. What linewidth should the protective photoresist line be to get these results? Sketch the resulting structure before photoresist strip. B) now you are using a completely anisotropic etch, what is the requisite linewidth of the photoresist to achieve the same end goal? Sketch the resulting structure before the stripping of the photoresist.
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